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    Strain-driven structure-ferroelectricity relationship in hexagonal TbMnO3 films

    R. Mandal1,2, M. Hirsbrunner1, V. Roddatis3, R. Gruhl4, L. Schüler1, U. Roß3, S. Merten1, P. Gegenwart4, and V. Moshnyaga1,*

    • 1Erstes Physikalisches Institut, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
    • 2Department of Physics, Indian Institute of Science Education and Research, Pune 411008, India
    • 3Institut für Materialphysik, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
    • 4Experimentalphysik VI, Center for Electronic Correlations and Magnetism, Augsburg University, D-86159 Augsburg, Germany

    • *vmosnea@gwdg.de

    Phys. Rev. B 102, 104106 – Published 18 September, 2020

    DOI: https://doi.org/10.1103/PhysRevB.102.104106

    Abstract

    Thin films and heterostructures of hexagonal manganites as promising multiferroic materials have attracted a considerable interest. We report structural transformations of high-quality strain-stabilized epitaxial hexagonal TbMnO3/yttria stabilized zirconia(111) (h-TMO) films, analyzed by means of various characterization techniques. A reversible structural phase transition from P63cm to P63/mmc structure at TC∼800K was observed in stoichiometric h-TMO films by temperature-dependent Raman spectroscopy and optical ellipsometry. The latter, directly probing the electronic system, indicates its modification at the structural phase transition, likely due to charge transfer from oxygen to Mn. A partially reversible phase transformation and stress relaxation was observed in h-TMO films with Tb excess after temperature cycling (300-1000-300 K) during Raman and ellipsometry. An inhomogeneous microstructure, containing ferroelectric and paraelectric nanodomains, was revealed by transmission electron microscopy in the Tb-rich film after annealing. The results obtained indicate a strong influence of stress, induced by temperature and by constrained sample geometry, onto the structure and ferroelectricity of strain-stabilized h-TMO thin films.

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